Design for Manufacturability with A - E-book

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Design For Manufacturability With Advanced Lithography - ENG

Bei Yu; David Z. Pan

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$1,780.00

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Sinopsis

ISBN:	9783319203850
Formato:	Page Fidelity
Idioma:	Inglés
Editorial:	Springer Nature
Tema:	Tecnología e ingeniería
Subtema:	Eletrónica circuitos
Año de publicación:	2015-10-28

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).Â The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography.Â Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

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